- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/105 - Photosensitive materials - characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Patent holdings for IPC class G03F 7/105
Total number of patents in this class: 346
10-year publication summary
27
|
24
|
29
|
65
|
47
|
20
|
27
|
21
|
18
|
13
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
68 |
Samsung SDI Co., Ltd. | 6671 |
41 |
DONGWOO FINE-CHEM Co., Ltd. | 1163 |
29 |
LG Chem, Ltd. | 17205 |
24 |
Boe Technology Group Co., Ltd. | 35384 |
14 |
Toray Industries, Inc. | 6652 |
9 |
Duk San Neolux Co., Ltd. | 512 |
9 |
Eastman Kodak Company | 3444 |
8 |
Samsung Display Co., Ltd. | 30585 |
7 |
Merck Patent GmbH | 5909 |
7 |
Agfa NV | 642 |
7 |
Cheil Industries Inc. | 944 |
5 |
Dai Nippon Printing Co., Ltd. | 3891 |
5 |
Samsung Electronics Co., Ltd. | 131630 |
4 |
Board of Regents, The University of Texas System | 5370 |
4 |
Datalase Ltd. | 115 |
4 |
Rohm and Haas Electronic Materials Korea Ltd. | 546 |
4 |
Samyang Corporation | 368 |
4 |
Adaptive 3D Technologies | 20 |
4 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
3 |
Other owners | 86 |